Gartner Research

Cleaning Processes for Semiconductor Manufacturing

Published: 08 December 2003

ID: G00118591

Analyst(s): Dean Freeman

Summary

Wafer-cleaning technology is a critical part of the semiconductor manufacturing process. The growth of the back-end-of-the-line process has created new opportunity for cleaning technology.

Table Of Contents
  • Executive Summary
  • Defining the Market
    • Segmentation
  • FEOL Cleans
    • Auto Wet Benches
    • Batch Spray
    • Single-Wafer Systems
  • BEOL Cleans
    • Auto Wet Benches
    • Batch Spray
    • Single-Wafer Systems
  • Future Applications
    • Supercritical Fluids
    • Cryogenic Cleans
    • Challenges
  • Glossary of Terms

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